Invention Grant
- Patent Title: Semiconductor rectifier device
- Patent Title (中): 半导体整流器
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Application No.: US13409820Application Date: 2012-03-01
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Publication No.: US08648447B2Publication Date: 2014-02-11
- Inventor: Makoto Mizukami , Masamu Kamaga , Kazuto Takao
- Applicant: Makoto Mizukami , Masamu Kamaga , Kazuto Takao
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2011-052785 20110310; JP2012-042375 20120228
- Main IPC: H01L29/868
- IPC: H01L29/868

Abstract:
A semiconductor rectifier device using an SiC semiconductor at least includes: an anode electrode; an anode area that adjoins the anode electrode and is made of a second conductivity type semiconductor; a drift layer that adjoins the anode area and is made of a first conductivity type semiconductor having a low concentration; a minority carrier absorption layer that adjoins the drift layer and is made of a first conductivity type semiconductor having a higher concentration than that of the drift layer; a high-resistance semiconductor area that adjoins the minority carrier absorption layer, has less thickness than the drift layer and is made of a first conductivity type semiconductor having a concentration lower than that of the minority carrier absorption layer; a cathode contact layer that adjoins the semiconductor area; and a cathode electrode.
Public/Granted literature
- US20120228635A1 SEMICONDUCTOR RECTIFIER DEVICE Public/Granted day:2012-09-13
Information query
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