Invention Grant
US08648997B2 Member with a cleaning surface and a method of removing contamination
失效
具有清洁表面的成员和去除污染的方法
- Patent Title: Member with a cleaning surface and a method of removing contamination
- Patent Title (中): 具有清洁表面的成员和去除污染的方法
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Application No.: US12629691Application Date: 2009-12-02
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Publication No.: US08648997B2Publication Date: 2014-02-11
- Inventor: Marcus Theodoor Wilhelmus Van Der Heijden , Mark Drewes Boerema , Matthias Ruhm , Mario Putz
- Applicant: Marcus Theodoor Wilhelmus Van Der Heijden , Mark Drewes Boerema , Matthias Ruhm , Mario Putz
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/58 ; G03F7/20
Abstract:
A member with a cleaning surface for use in capturing particles in a lithographic apparatus is disclosed. The particles are captured by a plurality of projections which are arranged in a pattern. A sensor can be used to detect contaminant particles in the pattern.
Public/Granted literature
- US20100141910A1 MEMBER WITH A CLEANING SURFACE AND A METHOD OF REMOVING CONTAMINATION Public/Granted day:2010-06-10
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