Invention Grant
- Patent Title: Alignment of light source focus
- Patent Title (中): 对准光源焦点
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Application No.: US12841728Application Date: 2010-07-22
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Publication No.: US08648999B2Publication Date: 2014-02-11
- Inventor: Matthew R. Graham , William N. Partlo , Steven Chang , Robert A. Bergstedt
- Applicant: Matthew R. Graham , William N. Partlo , Steven Chang , Robert A. Bergstedt
- Applicant Address: US CA San Diego
- Assignee: Cymer, LLC
- Current Assignee: Cymer, LLC
- Current Assignee Address: US CA San Diego
- Agency: DiBerardino McGovern IP Group LLC
- Main IPC: G01J3/00
- IPC: G01J3/00

Abstract:
An extreme ultraviolet light system includes a steering system that steers and focuses an amplified light beam traveling along a propagation direction to a focal plane near a target location within an extreme ultraviolet light chamber, a detection system including at least one detector positioned to detect an image of a laser beam reflected from at least a portion of a target material within the chamber, a wavefront modification system in the path of the reflected laser beam and between the target location and the detection system, and a controller. The wavefront modification system is configured to modify the wavefront of the reflected laser beam as a function of a target focal plane position along the propagation direction. The controller includes logic for adjusting a location of the focal plane of the amplified light beam relative to the target material based on the detected image of the reflected laser beam.
Public/Granted literature
- US20120019826A1 ALIGNMENT OF LIGHT SOURCE FOCUS Public/Granted day:2012-01-26
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