Invention Grant
- Patent Title: Fine grating and mold therefor
- Patent Title (中): 精细的光栅和模具
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Application No.: US11921324Application Date: 2006-05-22
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Publication No.: US08649096B2Publication Date: 2014-02-11
- Inventor: Kazuya Yamamoto , Makoto Okada
- Applicant: Kazuya Yamamoto , Makoto Okada
- Applicant Address: JP Osaka
- Assignee: Nalux Co., Ltd.
- Current Assignee: Nalux Co., Ltd.
- Current Assignee Address: JP Osaka
- Agency: Squire Sanders (US) LLP
- Priority: JP2005-164315 20050603
- International Application: PCT/JP2006/310167 WO 20060522
- International Announcement: WO2006/129514 WO 20061207
- Main IPC: G02B5/18
- IPC: G02B5/18 ; B29D11/00

Abstract:
This invention provides a mold with which a two-dimensional subwavelength grating can be produced with a higher percentage transfer by injection molding and a two-dimensional subwavelength grating having a high aspect ratio produced with such a mold. The mold for a fine grating according to the present invention has protrusion parts (107) arranged at an interval on the bottom face (103) of a cavity, wherein the interval is a distance between centers of the protrusion parts and a period of the fine grating smaller than wavelengths of visible lights. In one embodiment, a cross-section of the protrusion parts, parallel to the bottom face of the cavity decreases with height along the protrusion parts and a decreasing rate of the cross-section increases with height along the protrusions.
Public/Granted literature
- US20090034079A1 Fine grating and mold therefore Public/Granted day:2009-02-05
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