Invention Grant
US08649217B2 Non-volatile memory device and manufacturing method of the same 有权
非易失性存储器件及其制造方法相同

Non-volatile memory device and manufacturing method of the same
Abstract:
According to one embodiment, a memory cell section includes a memory layer in which a non-volatile memory cell is arranged at an intersecting position of a first wiring and a second wiring to be sandwiched by the first wiring and the second wiring. A first drawing section connects the memory cell section and a first contact section with the first wiring, and a second drawing section connects the memory cell section and a second contact section with the second wiring. A dummy pattern is provided in a layer corresponding to the memory layer immediately below the first and second wirings configuring the first and second drawing sections.
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