Invention Grant
- Patent Title: Non-volatile memory device and manufacturing method of the same
- Patent Title (中): 非易失性存储器件及其制造方法相同
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Application No.: US13418516Application Date: 2012-03-13
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Publication No.: US08649217B2Publication Date: 2014-02-11
- Inventor: Takuji Kuniya , Katsunori Yahashi
- Applicant: Takuji Kuniya , Katsunori Yahashi
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier, Neustadt, L.L.P.
- Priority: JP2011-203639 20110916
- Main IPC: G11C11/34
- IPC: G11C11/34

Abstract:
According to one embodiment, a memory cell section includes a memory layer in which a non-volatile memory cell is arranged at an intersecting position of a first wiring and a second wiring to be sandwiched by the first wiring and the second wiring. A first drawing section connects the memory cell section and a first contact section with the first wiring, and a second drawing section connects the memory cell section and a second contact section with the second wiring. A dummy pattern is provided in a layer corresponding to the memory layer immediately below the first and second wirings configuring the first and second drawing sections.
Public/Granted literature
- US20130069029A1 NON-VOLATILE MEMORY DEVICE AND MANUFACTURING METHOD OF THE SAME Public/Granted day:2013-03-21
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