Invention Grant
- Patent Title: Apparatus for holding semiconductor wafers
- Patent Title (中): 用于保持半导体晶片的装置
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Application No.: US12347580Application Date: 2008-12-31
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Publication No.: US08652260B2Publication Date: 2014-02-18
- Inventor: Chen-Hua Yu , Chien Ling Hwang
- Applicant: Chen-Hua Yu , Chien Ling Hwang
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater & Matsil, L.L.P.
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23F1/00 ; H01L21/306

Abstract:
Apparatus for holding semiconductor wafers during semiconductor manufacturing processes are disclosed. In one embodiment, the apparatus comprises a heat-conductive layer disposed on a supporting base. The apparatus also comprises a plurality of holes formed through the heat-conductive layer and the supporting base. The apparatus further comprises a plurality of heat-conductive lift pins that extend through the holes over the heat-conductive layer at the top end, and make a direct contact with a wafer substrate. The heat-conductive layer and the lift pins are connected to a heating circuit.
Public/Granted literature
- US20100032096A1 Apparatus for Holding Semiconductor Wafers Public/Granted day:2010-02-11
Information query
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