Invention Grant
US08652376B2 Process for producing nanostructured and/or microstructured surfaces in an adhesive layer, more particularly in a self-adhesive layer 失效
在粘合剂层中更具体地在自粘层中生产纳米结构和/或微结构化表面的方法

  • Patent Title: Process for producing nanostructured and/or microstructured surfaces in an adhesive layer, more particularly in a self-adhesive layer
  • Patent Title (中): 在粘合剂层中更具体地在自粘层中生产纳米结构和/或微结构化表面的方法
  • Application No.: US12033908
    Application Date: 2008-02-20
  • Publication No.: US08652376B2
    Publication Date: 2014-02-18
  • Inventor: Axel Burmeister
  • Applicant: Axel Burmeister
  • Applicant Address: DE Hamburg
  • Assignee: tesa SE
  • Current Assignee: tesa SE
  • Current Assignee Address: DE Hamburg
  • Agency: Norris McLaughlin & Marcus, P.A.
  • Main IPC: B29C43/46
  • IPC: B29C43/46
Process for producing nanostructured and/or microstructured surfaces in an adhesive layer, more particularly in a self-adhesive layer
Abstract:
The invention relates to a process for producing nanostructured and/or microstructured surfaces in an adhesive layer, more particularly in a self-adhesive layer, in which an adhesive polymer mixture, more particularly a self-adhesive polymer mixture, is guided into a nip formed by a relief roll, whose surface has been provided with a relief which represents the negative of the surface structure to be produced on the adhesive layer, and by a nip roll, and where the relief roll and the nip roll rotate in opposite directions, wrapped partly around the relief roll is a web-form carrier material which is guided through the nip and whose speed corresponds more particularly to the peripheral speed of the relief roll, the adhesive polymer mixture, more particularly the self-adhesive polymer mixture, is pressed through the nip, so that the near-roll surface of the polymer mixture is shaped in accordance with the relief, lies in layer form on the carrier material after passage through the nip, and is guided away with the carrier material.
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