Invention Grant
- Patent Title: Optical waveguide production method
- Patent Title (中): 光波导制作方法
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Application No.: US13236781Application Date: 2011-09-20
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Publication No.: US08652569B2Publication Date: 2014-02-18
- Inventor: Tomoyuki Hirayama
- Applicant: Tomoyuki Hirayama
- Applicant Address: JP Ibaraki-shi, Osaka
- Assignee: Nitto Denko Corporation
- Current Assignee: Nitto Denko Corporation
- Current Assignee Address: JP Ibaraki-shi, Osaka
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2010-240996 20101027
- Main IPC: B05D5/06
- IPC: B05D5/06

Abstract:
An optical waveguide production method is provided which reduces a transmission loss, improves alignment mark visual detectability, and ensures excellent productivity. In the optical waveguide production method, an under-cladding layer, a core and an alignment mark are formed on a surface of a metal substrate. On the other hand, a molding die is prepared which includes a cavity and an alignment mark to be associated with the alignment mark. In turn, light emitted from the side of the molding die is utilized for positioning the metal substrate and the molding die with reference to the pair of associated alignment marks. Then, an over-cladding layer is formed over the core. The alignment mark is formed from a photo-curable composition comprising the following components (A) and (B): (A) a polymerizable composition having a (meth)acrylate group; and (B) a photoradical polymerization initiator.
Public/Granted literature
- US20120107495A1 OPTICAL WAVEGUIDE PRODUCTION METHOD Public/Granted day:2012-05-03
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