Invention Grant
- Patent Title: Spin coating method and spin coating apparatus
- Patent Title (中): 旋涂法和旋涂设备
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Application No.: US12396706Application Date: 2009-03-03
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Publication No.: US08652571B2Publication Date: 2014-02-18
- Inventor: Keisuke Nakazawa
- Applicant: Keisuke Nakazawa
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- Priority: JP2008-053404 20080304
- Main IPC: B05D3/12
- IPC: B05D3/12
Abstract:
A spin coating apparatus that supplies a coating liquid to a substrate and rotating the substrate to form a coating film, has a holding part that holds the substrate mounted thereon in a horizontal position; a rotationally driving source that rotationally drives the holding part about a rotational axis parallel with the vertical direction, thereby rotating the substrate; and a coating liquid supplying part that supplies the coating liquid to the substrate held by the holding part.
Public/Granted literature
- US20090226615A1 SPIN COATING METHOD AND SPIN COATING APPARATUS Public/Granted day:2009-09-10
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