Invention Grant
US08652875B2 Method of manufacturing a thin-film transistor 有权
制造薄膜晶体管的方法

  • Patent Title: Method of manufacturing a thin-film transistor
  • Patent Title (中): 制造薄膜晶体管的方法
  • Application No.: US13626275
    Application Date: 2012-09-25
  • Publication No.: US08652875B2
    Publication Date: 2014-02-18
  • Inventor: Iwao Yagi
  • Applicant: Sony Corporation
  • Applicant Address: JP Tokyo
  • Assignee: Sony Corporation
  • Current Assignee: Sony Corporation
  • Current Assignee Address: JP Tokyo
  • Agency: K&L Gates LLP
  • Priority: JP2010-022161 20100203
  • Main IPC: H01L51/40
  • IPC: H01L51/40
Method of manufacturing a thin-film transistor
Abstract:
A method of manufacturing a thin film transistor is provided. The method includes forming a lower organic semiconductor layer, forming an upper organic semiconductor layer on the lower organic semiconductor layer, the upper organic semiconductor layer having solubility and conductivity higher than those of the lower organic semiconductor layer, forming a source electrode and a drain electrode spaced apart from each other and respectively overlapping the upper organic semiconductor layer, and dissolving the upper organic semiconductor layer selectively by using the source electrode and the drain electrode as a mask.
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