Invention Grant
- Patent Title: Electromagnetic field application system
- Patent Title (中): 电磁场应用系统
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Application No.: US12854262Application Date: 2010-08-11
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Publication No.: US08653472B2Publication Date: 2014-02-18
- Inventor: Ken Harada , Akira Sugawara , Noboru Moriya
- Applicant: Ken Harada , Akira Sugawara , Noboru Moriya
- Applicant Address: JP Tokyo
- Assignee: Hitachi, Ltd.
- Current Assignee: Hitachi, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2009-225864 20090930
- Main IPC: G21K5/04
- IPC: G21K5/04
Abstract:
The present invention is based on the property that the electric and magnetic fields are independent of each other and normal to each other and the property that the deflection of a charged particle beam by the electromagnetic field follows the rule of linear combination. The present invention employs a system that creates a region in which there exist both electromagnetic field and controls the deflection of a charged particle beam in each of the electric and magnetic fields.
Public/Granted literature
- US20110073759A1 ELECTROMAGENTIC FIELD APPLICATION SYSTEM Public/Granted day:2011-03-31
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