Invention Grant
- Patent Title: Target for laser produced plasma extreme ultraviolet light source
- Patent Title (中): 激光产生等离子体极光紫外光源的目标
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Application No.: US13830461Application Date: 2013-03-14
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Publication No.: US08653492B1Publication Date: 2014-02-18
- Inventor: Robert J. Rafac , Yezheng Tao
- Applicant: Cymer, Inc.
- Applicant Address: US CA San Diego
- Assignee: Cymer, LLC
- Current Assignee: Cymer, LLC
- Current Assignee Address: US CA San Diego
- Agency: DiBerardino McGovern IP Group LLC
- Main IPC: H05G2/00
- IPC: H05G2/00

Abstract:
Techniques for generating EUV light include directing a first pulse of radiation toward a target material droplet to form a modified droplet, the first pulse of radiation having an energy sufficient to alter a shape of the target material droplet; directing a second pulse of radiation toward the modified droplet to form an absorption material, the second pulse of radiation having an energy sufficient to change a property of the modified droplet, the property being related to absorption of radiation; and directing an amplified light beam toward the absorption material, the amplified light beam having an energy sufficient to convert at least a portion of the absorption material into extreme ultraviolet (EUV) light.
Public/Granted literature
- US08872143B2 Target for laser produced plasma extreme ultraviolet light source Public/Granted day:2014-10-28
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