Invention Grant
- Patent Title: Thin-film transistor and method for manufacturing the same
- Patent Title (中): 薄膜晶体管及其制造方法
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Application No.: US13639455Application Date: 2011-04-01
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Publication No.: US08653517B2Publication Date: 2014-02-18
- Inventor: Tetsufumi Kawamura , Hiroyuki Uchiyama , Hironori Wakana
- Applicant: Tetsufumi Kawamura , Hiroyuki Uchiyama , Hironori Wakana
- Applicant Address: JP Tokyo
- Assignee: Hitachi, Ltd.
- Current Assignee: Hitachi, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: JP2010-087808 20100406
- International Application: PCT/JP2011/058436 WO 20110401
- International Announcement: WO2011/125940 WO 20111013
- Main IPC: H01L29/786
- IPC: H01L29/786

Abstract:
In a TFT that adopts an oxide semiconductor as an active layer and has a resistance layer interposed between the active layer and one of a source and drain electrode, while Vth close to 0 V and a small off current are sustained, an on-current is increased. In a thin-film transistor including a gate electrode, a gate insulating film, a semiconductor layer, a source electrode, and a drain electrode, the semiconductor layer that links the source electrode and drain electrode is made of a metal oxide. The semiconductor layer includes three regions of first, second, and third regions. The first region is connected with the source electrode, the third region is connected with the drain electrode, and the second region is connected between the first region and third region. The resistivities of the three regions have the relationship of the first region>the second region>the third region.
Public/Granted literature
- US20130043469A1 Thin-Film Transistor and Method for Manufacturing the Same Public/Granted day:2013-02-21
Information query
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