Invention Grant
- Patent Title: Vertical semiconductor device
- Patent Title (中): 垂直半导体器件
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Application No.: US12437375Application Date: 2009-05-07
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Publication No.: US08653556B2Publication Date: 2014-02-18
- Inventor: Franz Josef Niedernostheide , Hans-Joachim Schulze
- Applicant: Franz Josef Niedernostheide , Hans-Joachim Schulze
- Applicant Address: AT Villach
- Assignee: Infineon Technologies Austria AG
- Current Assignee: Infineon Technologies Austria AG
- Current Assignee Address: AT Villach
- Agency: Maginot, Moore & Beck
- Priority: DE102005049506 20051013
- Main IPC: H01L29/739
- IPC: H01L29/739

Abstract:
A vertical semiconductor device includes a semiconductor body, and first and second contacts on opposite sides of the semiconductor body. A plurality of regions are formed in the semiconductor body including, in a direction from the first contact to the second contact, a first region of a first conductivity type, a second region of a second conductivity type; and a third region of the first conductivity type. The third region is electrically connected to the second contact. A semiconductor zone of the second conductivity type and increased doping density is arranged in the second region. The semiconductor zone separates a first part of the second region from a second part of the second region. The semiconductor zone has a maximum doping density exceeding about 1016 cm−3 and a thickness along the direction from the first contact to the second contact of less than about 3 μm.
Public/Granted literature
- US20090212322A1 Vertical Semiconductor Device Public/Granted day:2009-08-27
Information query
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