Invention Grant
- Patent Title: Semiconductor device and wafer
- Patent Title (中): 半导体器件和晶圆
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Application No.: US13236353Application Date: 2011-09-19
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Publication No.: US08653629B2Publication Date: 2014-02-18
- Inventor: Shoji Seta , Yojiro Hamasaki
- Applicant: Shoji Seta , Yojiro Hamasaki
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Sprinkle IP Law Group
- Priority: JP2011-068712 20110325
- Main IPC: H01L23/544
- IPC: H01L23/544

Abstract:
A semiconductor device has a semiconductor substrate. The semiconductor device has a plurality of LSI regions that are formed on the semiconductor substrate and are provided with a first power supply wiring layer including a first power supply wire. The semiconductor device has a first power supply terminal formed on the semiconductor substrate. The semiconductor device has a second power supply wiring layer including a second power supply wire that electrically connects the first power supply wire and the first power supply terminal, the second power supply wiring layer is formed in a dicing region between the LSI regions along a dicing line that separates the LSI regions and the dicing line region. A first barrier metal film is formed at least in the LSI regions at a boundary between the first power supply wire and the second power supply wire.
Public/Granted literature
- US20120242402A1 SEMICONDUCTOR DEVICE AND WAFER Public/Granted day:2012-09-27
Information query
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