Invention Grant
US08654325B2 Substrate processing apparatus, substrate processing method, and computer-readable storage medium having program for executing the substrate processing method stored therein
有权
基板处理装置，基板处理方法以及具有用于执行其中存储的基板处理方法的程序的计算机可读存储介质
- Patent Title: Substrate processing apparatus, substrate processing method, and computer-readable storage medium having program for executing the substrate processing method stored therein
- Patent Title (中): 基板处理装置，基板处理方法以及具有用于执行其中存储的基板处理方法的程序的计算机可读存储介质
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Application No.: US13540723Application Date: 2012-07-03
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Publication No.: US08654325B2Publication Date: 2014-02-18
- Inventor: Kenji Nakamizo , Satoshi Morita
- Applicant: Kenji Nakamizo , Satoshi Morita
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Abelman, Frayne & Schwab
- Priority: JP2011-149364 20110705; JP2011-149365 20110705
- Main IPC: G01N21/88
- IPC: G01N21/88
Abstract:
Provided is a substrate processing apparatus including a placement table on which a substrate is disposed; a light source configured to irradiate light on the surface of the substrate on the placement unit; a detector configured to detect the light amount reflected from the substrate; and a control unit configured to perform a determination process of determining whether a detection value of the light amount is smaller than a predetermined value at a plurality of positions, and to determine that a holding state of the substrate is abnormal when the total number of times of determination in which it is determined that the detection value is smaller than the predetermined value reaches a predetermined number of times.
Public/Granted literature
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