Invention Grant
US08656509B2 Scanning probe microscope and surface shape measuring method using same
有权
扫描探针显微镜和使用其的表面形状测量方法
- Patent Title: Scanning probe microscope and surface shape measuring method using same
- Patent Title (中): 扫描探针显微镜和使用其的表面形状测量方法
-
Application No.: US13704051Application Date: 2011-05-20
-
Publication No.: US08656509B2Publication Date: 2014-02-18
- Inventor: Masahiro Watanabe , Toshihiko Nakata , Takehiro Tachizaki
- Applicant: Masahiro Watanabe , Toshihiko Nakata , Takehiro Tachizaki
- Applicant Address: JP Tokyo
- Assignee: Hitachi, Ltd.
- Current Assignee: Hitachi, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: JP2010-205611 20100914
- International Application: PCT/JP2011/061680 WO 20110520
- International Announcement: WO2012/035826 WO 20120322
- Main IPC: G21K7/00
- IPC: G21K7/00

Abstract:
It has been difficult to highly accurately measure the profiles of samples using scanning probe microscopes at the time when scanning is performed due to scanning mechanism fluctuations in the non drive direction, i.e., vertical direction. The present invention is provided with, on the rear side of a sample stage, a high-accuracy displacement gauge for measuring fluctuation in the non drive direction, i.e., vertical direction, at the time when the sample stage is being scanned in the horizontal directions, and as a result, highly accurate planarity evaluation with accuracy of sample nm-order or less is made possible by correcting sample surface shape measurement results obtained using a probe.
Public/Granted literature
- US20130212749A1 Scanning Probe Microscope and Surface Shape Measuring Method Using Same Public/Granted day:2013-08-15
Information query