Invention Grant
US08659127B2 Wiring substrate, semiconductor device and manufacturing method thereof 有权
配线基板,半导体装置及其制造方法

Wiring substrate, semiconductor device and manufacturing method thereof
Abstract:
A semiconductor device includes a wiring substrate, and a semiconductor chip, wherein the wiring substrate includes a glass plate having an opening portion penetrating through a first surface of the glass plate to a second surface of the glass plate, a resin portion penetrating through the first surface to the second surface, and a through wiring penetrating through the resin portion from the first surface to the second surface to electrically connect a first wiring layer formed on a side of the first surface with a third wiring layer formed on a side of the second surface, wherein the semiconductor chip is accommodated inside the opening portion.
Information query
Patent Agency Ranking
0/0