Invention Grant
- Patent Title: Mechanical layer and methods of making the same
- Patent Title (中): 机械层及其制作方法
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Application No.: US13093716Application Date: 2011-04-25
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Publication No.: US08659816B2Publication Date: 2014-02-25
- Inventor: Yi Tao , Hojin Lee , Fan Zhong
- Applicant: Yi Tao , Hojin Lee , Fan Zhong
- Applicant Address: US CA San Diego
- Assignee: Qualcomm Mems Technologies, Inc.
- Current Assignee: Qualcomm Mems Technologies, Inc.
- Current Assignee Address: US CA San Diego
- Agency: Knobbe, Martens, Olson & Bear LLP
- Main IPC: G02B26/00
- IPC: G02B26/00 ; G09G3/34

Abstract:
This disclosure provides mechanical layers and methods of forming the same. In one aspect, a method of forming a pixel includes depositing a black mask on a substrate, depositing an optical stack over the black mask, and forming a mechanical layer over the optical stack. The black mask is disposed along at least a portion of a side of the pixel, and the mechanical layer defines a cavity between the mechanical layer and the optical stack. The mechanical layer includes a reflective layer, a dielectric layer, and a cap layer, and the dielectric layer is disposed between the reflective layer and the cap layer. The method further includes forming a notch in the dielectric layer of the mechanical layer along the side of the pixel so as to reduce the overlap of the dielectric layer with the black mask along the side of the pixel.
Public/Granted literature
- US20120268430A1 MECHANICAL LAYER AND METHODS OF MAKING THE SAME Public/Granted day:2012-10-25
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