Invention Grant
- Patent Title: Superwide-angle lens system
- Patent Title (中): 超广角镜头系统
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Application No.: US13570389Application Date: 2012-08-09
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Publication No.: US08659841B2Publication Date: 2014-02-25
- Inventor: Takashi Enomoto
- Applicant: Takashi Enomoto
- Applicant Address: JP Tokyo
- Assignee: Pentax Ricoh Imaging Company, Ltd.
- Current Assignee: Pentax Ricoh Imaging Company, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Greenblum & Bernstein P.L.C.
- Priority: JP2011-176111 20110811
- Main IPC: G02B13/04
- IPC: G02B13/04 ; G02B9/10

Abstract:
A superwide-angle lens system includes a negative first lens group, an aperture diaphragm, and a positive second lens group. The first lens group includes two negative meniscus lens elements, and a positive lens element. The second lens group includes a cemented lens having negative and positive lens elements; and a positive lens element. The following conditions (1) and (2) are satisfied: −1.45
Public/Granted literature
- US20130038950A1 SUPERWIDE-ANGLE LENS SYSTEM Public/Granted day:2013-02-14
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