Invention Grant
- Patent Title: Defect inspection system
- Patent Title (中): 缺陷检查系统
-
Application No.: US13593227Application Date: 2012-08-23
-
Publication No.: US08660336B2Publication Date: 2014-02-25
- Inventor: Taketo Ueno , Yasuhiro Yoshitake
- Applicant: Taketo Ueno , Yasuhiro Yoshitake
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2005-258664 20050907
- Main IPC: G06K9/00
- IPC: G06K9/00 ; G01R31/26 ; G01N21/00 ; G06F17/50

Abstract:
A defect inspection system is disclosed for easily setting inspection conditions and providing an inspection condition and a defect signal intensity to an operator. The defect inspection system digitizes a defective image, and a reference image corresponding thereto and a mismatched portion of the defective image and the reference image as a defect signal intensity and accumulates them in association with the inspection condition. The inspection conditions are changed to repeat evaluations while repeating accumulating works until the evaluation of all the inspection conditions in a set range is completed. A recipe file including the accumulated conditions having the high defect signal intensity and an inspection condition item distribution as a inspection condition recipe is automatically outputted and provided to the operator.
Public/Granted literature
- US20130058558A1 DEFECT INSPECTION SYSTEM Public/Granted day:2013-03-07
Information query