Invention Grant
- Patent Title: Method of manufacturing a piezoelectronic device
- Patent Title (中): 制造压电装置的方法
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Application No.: US13106322Application Date: 2011-05-12
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Publication No.: US08661635B2Publication Date: 2014-03-04
- Inventor: Wen-Kuang Hsu , Hsin-Fu Kuo , Yu-Hsien Lin , Chiung-Wen Tang , Chieh-Lien Lu , Yao-Cheng Lai
- Applicant: Wen-Kuang Hsu , Hsin-Fu Kuo , Yu-Hsien Lin , Chiung-Wen Tang , Chieh-Lien Lu , Yao-Cheng Lai
- Applicant Address: TW Hsinchu
- Assignee: National Tsing Hua University
- Current Assignee: National Tsing Hua University
- Current Assignee Address: TW Hsinchu
- Agency: Bacon & Thomas, PLLC
- Priority: TW99103302A 20100204
- Main IPC: H01L41/24
- IPC: H01L41/24

Abstract:
A piezoelectronic device and a method of fabricating the same are provided. The piezoelectronic device has a plurality of carbon nanotubes; at least one piezoceramic layer covering the plurality of carbon nanotubes; and a supporting material for supporting the carbon nanotubes and disposed between the carbon nanotubes, the supporting layer being coated with at least one piezoceramic layer, wherein the plurality of carbon nanotubes is arranged in a comb-shape.
Public/Granted literature
- US20110214264A1 PIEZOELECTRONIC DEVICE AND METHOD OF FABRICATING THE SAME Public/Granted day:2011-09-08
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