Invention Grant
US08662011B2 Apparatus for carrying out plasma chemical vapour deposition and method of manufacturing an optical preform
有权
用于进行等离子体化学气相沉积的装置和制造光学预型件的方法
- Patent Title: Apparatus for carrying out plasma chemical vapour deposition and method of manufacturing an optical preform
- Patent Title (中): 用于进行等离子体化学气相沉积的装置和制造光学预型件的方法
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Application No.: US12113512Application Date: 2008-05-01
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Publication No.: US08662011B2Publication Date: 2014-03-04
- Inventor: Mattheus Jacobus Nicolaas Van Stralen , Igor Milicevic , Johannes Antoon Hartsuiker
- Applicant: Mattheus Jacobus Nicolaas Van Stralen , Igor Milicevic , Johannes Antoon Hartsuiker
- Applicant Address: NL
- Assignee: Draka Comteq B.V.
- Current Assignee: Draka Comteq B.V.
- Current Assignee Address: NL
- Agency: Shumaker, Loop & Kendrick, LLP
- Priority: NL1033783 20070501
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23F1/00 ; H01L21/306
Abstract:
The present invention relates to an apparatus for carrying out plasma chemical vapor deposition, by which one or more layers of doped or undoped silica are deposited onto the interior of an elongated hollow glass substrate tube. The present invention further relates to a method of manufacturing an optical preform by means of plasma chemical vapor deposition, wherein doped or undoped glass-forming gases are passed through the interior of an elongated glass substrate tube while conditions for depositing glass layers are created in the interior of the substrate tube.
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