Invention Grant
- Patent Title: Method for manufacturing crystal oscillator
- Patent Title (中): 制造晶体振荡器的方法
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Application No.: US12997927Application Date: 2009-10-16
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Publication No.: US08663487B2Publication Date: 2014-03-04
- Inventor: Akiko Katoh , Tohru Yanagisawa
- Applicant: Akiko Katoh , Tohru Yanagisawa
- Applicant Address: JP Tokyo
- Assignee: Citizen Holdings Co., Ltd.
- Current Assignee: Citizen Holdings Co., Ltd.
- Current Assignee Address: JP Tokyo
- Priority: JP2008-267061 20081016; JP2008-299479 20081125
- International Application: PCT/JP2009/068216 WO 20091016
- International Announcement: WO2010/044491 WO 20100422
- Main IPC: G01C19/56
- IPC: G01C19/56 ; H03H9/215 ; H03H9/21 ; H03H9/02 ; H03H3/02 ; G01C19/5628

Abstract:
The invention is directed to the provision of a method for manufacturing a crystal oscillator manufacturing method that can achieve a highly precise fine adjustment without applying unnecessary external force to a crystal oscillator, and that can adjust a plurality of crystal oscillators in a collective manner. More specifically, the invention provides a method for manufacturing a crystal oscillator includes a first etching step for forming a prescribed external shape, an electrode forming step for forming an electrode at least in a portion of a surface of the external shape, a leakage amount measuring step for measuring leakage amount associated with leakage vibration of the external shape, and a second etching step for etching the external shape by an amount that is determined based on a measurement result of the leakage amount measuring step so as to adjust balance.
Public/Granted literature
- US20110163063A1 METHOD FOR MANUFACTURING CRYSTAL OSCILLATOR Public/Granted day:2011-07-07
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