Invention Grant
US08664014B2 High productivity combinatorial workflow for photoresist strip applications
失效
用于光刻胶剥离应用的高生产率组合工作流程
- Patent Title: High productivity combinatorial workflow for photoresist strip applications
- Patent Title (中): 用于光刻胶剥离应用的高生产率组合工作流程
-
Application No.: US13298524Application Date: 2011-11-17
-
Publication No.: US08664014B2Publication Date: 2014-03-04
- Inventor: Bei Li , Sean Barstow , Anh Duong , Zhendong Hong , Ashley Lacey
- Applicant: Bei Li , Sean Barstow , Anh Duong , Zhendong Hong , Ashley Lacey
- Applicant Address: US CA San Jose
- Assignee: Intermolecular, Inc.
- Current Assignee: Intermolecular, Inc.
- Current Assignee Address: US CA San Jose
- Main IPC: G01R31/26
- IPC: G01R31/26 ; H01L21/66
Abstract:
Electrical testing of metal oxide semiconductor (MOS) high-k capacitor structures is used to evaluate photoresist strip or cleaning chemicals using a combinatorial workflow. The electrical testing can be able to identify the damages on the high-k dielectrics, permitting a selection of photoresist strip chemicals to optimize the process conditions in the fabrication of semiconductor devices. The high productivity combinatorial technique can provide a compatibility evaluation of photoresist strip chemicals with high-k devices.
Public/Granted literature
- US20130130414A1 HIGH PRODUCTIVITY COMBINATORIAL WORKFLOW FOR PHOTORESIST STRIP APPLICATIONS Public/Granted day:2013-05-23
Information query
