Invention Grant
US08664071B2 Castellated gate MOSFET tetrode capable of fully-depleted operation 有权
能够完全耗尽操作的Castellated栅极MOSFET四极管

Castellated gate MOSFET tetrode capable of fully-depleted operation
Abstract:
A method of fabricating a castellated-gate MOSFET tetrode device capable of fully depleted operation is disclosed. The device is formed on a semiconductor substrate region having an upper portion with a top surface and a lower portion with a bottom surface. A source region and a drain region are formed by ion implantation into the semiconductor substrate region, with adjoined primary and secondary channel-forming regions also disposed therein between the source and drain regions, thereby forming an integrated cascode structure. A plurality of thin semiconductor channel elements are formed by etching a plurality of spaced gate slots to a first predetermined depth into the substrate. The formation of first, second, and additional gate structures are described in two possible embodiments which facilitate the formation of self-aligned source and drain regions.
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