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US08664106B2 Method of manufacturing semiconductor device 失效
制造半导体器件的方法

  • Patent Title: Method of manufacturing semiconductor device
  • Patent Title (中): 制造半导体器件的方法
  • Application No.: US13394573
    Application Date: 2010-09-07
  • Publication No.: US08664106B2
    Publication Date: 2014-03-04
  • Inventor: Haruo Iwatsu
  • Applicant: Haruo Iwatsu
  • Applicant Address: JP Tokyo
  • Assignee: Tokyo Electron Limited
  • Current Assignee: Tokyo Electron Limited
  • Current Assignee Address: JP Tokyo
  • Agency: IPUSA, PLLC
  • Priority: JP2009-207971 20090909
  • International Application: PCT/JP2010/065312 WO 20100907
  • International Announcement: WO2011/030753 WO 20110317
  • Main IPC: H01L21/44
  • IPC: H01L21/44
Method of manufacturing semiconductor device
Abstract:
A method of manufacturing a semiconductor device, wherein a first substrate where first electrode pads are formed and a second substrate where second electrode pads are formed are stacked and the first electrode pads and the corresponding second electrode pads are electrically connected thereby forming the semiconductor device is disclosed. The method includes steps of performing a first hydrophilic treatment with respect to the first electrode pads; supplying liquid to a surface where the first electrode pads are formed in the first substrate; and placing the second substrate on the first substrate to which the liquid is supplied so that the surface where the first electrode pads are formed opposes a surface where the second electrode pads are formed, thereby aligning the first electrode pads and the second electrode pads by the liquid that gathers in the first electrode pads that have been subject to the first hydrophilic treatment.
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