- Patent Title: Method for applying liquid material, application device and program
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Application No.: US13389895Application Date: 2010-08-06
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Publication No.: US08664107B2Publication Date: 2014-03-04
- Inventor: Kazumasa Ikushima
- Applicant: Kazumasa Ikushima
- Applicant Address: JP Tokyo
- Assignee: Musashi Engineering, Inc.
- Current Assignee: Musashi Engineering, Inc.
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2009-186349 20090811
- International Application: PCT/JP2010/063346 WO 20100806
- International Announcement: WO2011/018988 WO 20110217
- Main IPC: H01L21/44
- IPC: H01L21/44

Abstract:
Disclosed are an application method, device and program which enable the constant retention of a fillet shape, without altering the shape due to the speed differences associated with changes in the direction of the nozzle or differences in the degree of penetration when bumps are arranged non-uniformly. In a liquid material application method a desired application pattern is created, liquid material is discharged from a nozzle whilst the nozzle and a workpiece are moved relative to one another, and the gap between a substrate and the workpiece, the workpiece being placed above the substrate by means of at least three bumps, is filled up with liquid material by capillary action. If bumps are arranged non-uniformly, the supply quantity per unit area of the application pattern is set so that a greater quantity is supplied to application areas next to areas where the integration density of bumps is high, than is supplied to application areas next to areas where the integration density of bumps is low.
Public/Granted literature
- US08703601B2 Method for applying liquid material, application device and program Public/Granted day:2014-04-22
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