Invention Grant
- Patent Title: Graphene substituted with boron and nitrogen, method of fabricating the same, and transistor having the same
- Patent Title (中): 用硼和氮取代的石墨烯,其制造方法和具有其的晶体管
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Application No.: US13064896Application Date: 2011-04-25
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Publication No.: US08664439B2Publication Date: 2014-03-04
- Inventor: Sung-Hoon Lee , Sun-ae Seo , Yun-sung Woo , Hyun-jong Chung , Jin-seong Heo
- Applicant: Sung-Hoon Lee , Sun-ae Seo , Yun-sung Woo , Hyun-jong Chung , Jin-seong Heo
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2010-058604 20100621
- Main IPC: C07F5/02
- IPC: C07F5/02

Abstract:
Graphene, a method of fabricating the same, and a transistor having the graphene are provided, the graphene includes a structure of carbon (C) atoms partially substituted with boron (B) atoms and nitrogen (N) atoms. The graphene has a band gap. The graphene substituted with boron and nitrogen may be used as a channel of a field effect transistor. The graphene may be formed by performing chemical vapor deposition (CVD) method using borazine or ammonia borane as a boron nitride (B—N) precursor.
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