Invention Grant
US08664689B2 Memory cell access device having a pn-junction with polycrystalline plug and single-crystal semiconductor regions
有权
具有与多晶硅插头和单晶半导体区域的pn结的存储单元访问装置
- Patent Title: Memory cell access device having a pn-junction with polycrystalline plug and single-crystal semiconductor regions
- Patent Title (中): 具有与多晶硅插头和单晶半导体区域的pn结的存储单元访问装置
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Application No.: US12267492Application Date: 2008-11-07
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Publication No.: US08664689B2Publication Date: 2014-03-04
- Inventor: Hsiang-Lan Lung , Erh-Kun Lai , Yen-Hao Shih , Yi-Chou Chen , Shih-Hung Chen
- Applicant: Hsiang-Lan Lung , Erh-Kun Lai , Yen-Hao Shih , Yi-Chou Chen , Shih-Hung Chen
- Applicant Address: TW Hsinchu
- Assignee: Macronix International Co., Ltd.
- Current Assignee: Macronix International Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Haynes Beffel & Wolfeld LLP
- Main IPC: H01L29/861
- IPC: H01L29/861 ; H01L29/88

Abstract:
A memory device includes a driver comprising a pn-junction in the form of a multilayer stack including a first doped semiconductor region having a first conductivity type, and a second doped semiconductor plug having a second conductivity type opposite the first conductivity type, the first and second doped semiconductors defining a pn junction therebetween, in which the first doped semiconductor region is formed in a single-crystalline semiconductor, and the second doped semiconductor region includes a polycrystalline semiconductor. Also, a method for making a memory device includes forming a first doped semiconductor region of a first conductivity type in a single-crystal semiconductor, such as on a semiconductor wafer; and forming a second doped polycrystalline semiconductor region of a second conductivity type opposite the first conductivity type, defining a pn junction between the first and second regions.
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