Invention Grant
- Patent Title: Power MOSFET
- Patent Title (中): 功率MOSFET
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Application No.: US13596081Application Date: 2012-08-28
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Publication No.: US08664714B2Publication Date: 2014-03-04
- Inventor: Chu-Kuang Liu
- Applicant: Chu-Kuang Liu
- Applicant Address: TW Hsinchu County
- Assignee: Excelliance MOS Corporation
- Current Assignee: Excelliance MOS Corporation
- Current Assignee Address: TW Hsinchu County
- Agency: Jianq Chyun IP Office
- Priority: TW101205178A 20120322
- Main IPC: H01L29/66
- IPC: H01L29/66

Abstract:
A power MOSFET includes an epitaxy substrate, conductive trenches, well regions and a dielectric layer. The power MOSFET further has at least one termination structure including at lest one of the conductive trenches, some of the well regions within a termination area and mutually insulated by the conductive trench, a field plate, a contact plug and a heavily-doped region. The field plate including a plate metal and the dielectric layer is on the well regions and the conductive trench within the termination area. The contact plug penetrates through the dielectric layer and connects the plate metal and one of the well regions, so the plate metal has equal potential with the connected well region through the contact plug. The well regions and the conductive trench are electrically coupled to the plate metal by the dielectric layer. The heavily-doped region is between the contact plug and the connected well region.
Public/Granted literature
- US20130248986A1 POWER MOSFET Public/Granted day:2013-09-26
Information query
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