Invention Grant
- Patent Title: Semiconductor devices having slit well tub
- Patent Title (中): 具有狭缝井筒的半导体装置
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Application No.: US13081128Application Date: 2011-04-06
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Publication No.: US08664724B2Publication Date: 2014-03-04
- Inventor: Se-Young Kim , Gi-Young Yang
- Applicant: Se-Young Kim , Gi-Young Yang
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel Sibley & Sajovec, P.A.
- Priority: KR10-2010-0039090 20100427
- Main IPC: H01L23/62
- IPC: H01L23/62

Abstract:
An electrostatic discharge semiconductor device can include a first conductivity type substrate that includes inner first conductivity type wells therein and a plurality of gate electrodes that are on an active region of the substrate. A second conductivity type well can be located in the substrate beneath the plurality of gate electrodes including at least one slit therein providing electrical contact between the inner first conductivity type wells and a first conductivity type outer well outside the active region.
Public/Granted literature
- US20110260254A1 SEMICONDUCTOR DEVICES HAVING SLIT WELL TUB Public/Granted day:2011-10-27
Information query
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