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US08664724B2 Semiconductor devices having slit well tub 有权
具有狭缝井筒的半导体装置

Semiconductor devices having slit well tub
Abstract:
An electrostatic discharge semiconductor device can include a first conductivity type substrate that includes inner first conductivity type wells therein and a plurality of gate electrodes that are on an active region of the substrate. A second conductivity type well can be located in the substrate beneath the plurality of gate electrodes including at least one slit therein providing electrical contact between the inner first conductivity type wells and a first conductivity type outer well outside the active region.
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