Invention Grant
- Patent Title: Interposer having a defined through via pattern
- Patent Title (中): 内插器具有定义的通孔图案
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Application No.: US13463474Application Date: 2012-05-03
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Publication No.: US08664768B2Publication Date: 2014-03-04
- Inventor: Shih-Wei Liang , Kai-Chiang Wu , Ming-Kai Liu , Chia-Chun Miao , Chun-Lin Lu
- Applicant: Shih-Wei Liang , Kai-Chiang Wu , Ming-Kai Liu , Chia-Chun Miao , Chun-Lin Lu
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H01L23/48
- IPC: H01L23/48 ; H01L23/52 ; H01L29/40 ; H01L23/053 ; H01L23/12

Abstract:
A structure includes a substrate having a plurality of balls, a semiconductor chip, and an interposer electrically connecting the substrate and the semiconductor chip. The interposer includes a first side, a second side opposite the first side, at least one first exclusion zone extending through the interposer above each ball of the plurality of balls, at least one active through via extending from the first side of the interposer to the second side of the interposer, wherein the at least one active through via is formed outside the at least one first exclusion zone and wherein no active through vias are formed within the at least one first exclusion zone, and at least one dummy through via extending from the first side of the interposer to the second side of the interposer, wherein the at least one dummy through via is formed within the at least one first exclusion zone.
Public/Granted literature
- US20130292830A1 Interposer Having a Defined Through Via Pattern Public/Granted day:2013-11-07
Information query
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