Invention Grant
- Patent Title: Low-power gaseous plasma source
- Patent Title (中): 低功率气体等离子体源
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Application No.: US13124451Application Date: 2009-10-16
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Publication No.: US08664862B2Publication Date: 2014-03-04
- Inventor: Pascal Sortais , Thierry Lamy
- Applicant: Pascal Sortais , Thierry Lamy
- Applicant Address: FR Paris Cedex
- Assignee: Centre National de la Recherche Scientifique
- Current Assignee: Centre National de la Recherche Scientifique
- Current Assignee Address: FR Paris Cedex
- Agency: Vedder Price PC
- Priority: FR0857068 20081017
- International Application: PCT/FR2009/051986 WO 20091016
- International Announcement: WO2010/043831 WO 20100422
- Main IPC: H05H1/40
- IPC: H05H1/40 ; H05H1/24
Abstract:
A plasma source includes a first rod forming a quarterwave antenna, surrounded by at least one parallel rod forming a coupler and which is substantially the same length as the first rod, set to a reference potential, the coupler rods being evenly distributed radially about the first rod, at a distance of around one-fifth to one-twentieth of the quarter of the wavelength.
Public/Granted literature
- US20110260621A1 LOW-POWER GASEOUS PLASMA SOURCE Public/Granted day:2011-10-27
Information query
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