Invention Grant
- Patent Title: Projection optical system, exposure apparatus, and device manufacturing method
- Patent Title (中): 投影光学系统，曝光装置和装置制造方法
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Application No.: US12050903Application Date: 2008-03-18
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Publication No.: US08665418B2Publication Date: 2014-03-04
- Inventor: Yasuhiro Omura
- Applicant: Yasuhiro Omura
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Klarquist Sparkman, LLP
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03B27/52 ; G03B27/42
Abstract:
A projection optical system for forming an image of a first surface on a second surface has a first imaging optical system and a second imaging optical system, and a folding member for guiding light from the first imaging optical system to the second imaging optical system. Every optical element having a power in the second imaging optical system is a refractive element.
Public/Granted literature
- US20080259440A1 PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD Public/Granted day:2008-10-23
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