Invention Grant
- Patent Title: Eccentricity measuring method
- Patent Title (中): 偏心测量方法
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Application No.: US13640709Application Date: 2011-04-05
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Publication No.: US08665425B2Publication Date: 2014-03-04
- Inventor: Kazuyuki Ogura , Masahiro Okitsu , Youichi Ogawa , Kyu Takada
- Applicant: Kazuyuki Ogura , Masahiro Okitsu , Youichi Ogawa , Kyu Takada
- Applicant Address: JP Tokyo
- Assignee: Konica Minolta Advanced Layers, Inc.
- Current Assignee: Konica Minolta Advanced Layers, Inc.
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- Priority: JP2010-092057 20100413
- International Application: PCT/JP2011/002018 WO 20110405
- International Announcement: WO2011/129068 WO 20111020
- Main IPC: G01B9/00
- IPC: G01B9/00 ; G01M11/02

Abstract:
In an eccentricity measuring method according to the present invention, a first position of a light source image formed by reflection at one optical surface is measured (S2), a predetermined second position related to another optical surface is measured (S3), and a relative eccentricity between both optical surfaces is calculated based on the first and second positions (S5). Therefore, the eccentricity measuring method enables measurement of eccentricity by a same measurement optical system regardless of a radius of curvature of an optical surface of an optical element.
Public/Granted literature
- US20130027692A1 ECCENTRICITY MEASURING METHOD Public/Granted day:2013-01-31
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