Invention Grant
- Patent Title: Method and device for examining a laser system
- Patent Title (中): 用于检查激光系统的方法和装置
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Application No.: US13501121Application Date: 2009-11-09
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Publication No.: US08665428B2Publication Date: 2014-03-04
- Inventor: Matthias Fösel , Olaf Kittelmann , Klaus Vogler
- Applicant: Matthias Fösel , Olaf Kittelmann , Klaus Vogler
- Applicant Address: DE Erlangen
- Assignee: Wavelight GmbH
- Current Assignee: Wavelight GmbH
- Current Assignee Address: DE Erlangen
- International Application: PCT/EP2009/008001 WO 20091109
- International Announcement: WO2011/054367 WO 20110512
- Main IPC: G01J1/00
- IPC: G01J1/00 ; G01J1/34 ; G01J1/42

Abstract:
A method for analyzing a laser system, which has a focused laser beam and a controllable deflection assembly for controlling the transverse and/or longitudinal position of the beam focus, said method comprising the steps of directing the laser beam or a partial beam branched therefrom downstream of the deflection assembly toward an optically nonlinear medium for the purpose of generating frequency multiplied radiation, the wavelength of which corresponds to an uneven higher harmonic of the wavelength of the laser beam, activating the deflection assembly, and measuring a power of the frequency multiplied radiation while the deflection assembly is activated. The conversion efficiency of the nonlinear process by which the frequency multiplied radiation is produced is dependent upon the focusability of the laser beam. By evaluating the measured power of the frequency multiplied radiation, dynamic impairments of focusability can be detected, which can be caused by inertia-induced deformations of optical scan components of the laser system.
Public/Granted literature
- US20120206720A1 METHOD AND DEVICE FOR EXAMINING A LASER SYSTEM Public/Granted day:2012-08-16
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