Invention Grant
- Patent Title: Micro-pattern transferring stamper
- Patent Title (中): 微图案转印压模
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Application No.: US13581169Application Date: 2011-02-16
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Publication No.: US08668487B2Publication Date: 2014-03-11
- Inventor: Satoshi Ishii , Masahiko Ogino , Noritake Shizawa , Kyoichi Mori , Akihiro Miyauchi
- Applicant: Satoshi Ishii , Masahiko Ogino , Noritake Shizawa , Kyoichi Mori , Akihiro Miyauchi
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Volpe and Koenig, P.C.
- Priority: JP2010-069558 20100325
- International Application: PCT/JP2011/053216 WO 20110216
- International Announcement: WO2011/118289 WO 20110929
- Main IPC: B29C59/16
- IPC: B29C59/16
Abstract:
A micro-pattern transferring stamper includes a supporting base material and a microstructure layer formed on the supporting base material, the microstructure layer is a polymer of a resin composition that mainly contains a silsesquioxane derivative containing a plurality of polymerizable functional groups, and one or plural kinds of monomer elements containing a plurality of polymerizable functional groups.
Public/Granted literature
- US20120321738A1 MICRO-PATTERN TRANSFERRING STAMPER Public/Granted day:2012-12-20
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