Invention Grant
- Patent Title: Machine CVD shower head
- Patent Title (中): 机器CVD淋浴头
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Application No.: US12058380Application Date: 2008-03-28
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Publication No.: US08668775B2Publication Date: 2014-03-11
- Inventor: Vahid S. Moshtagh , Jeffrey C. Ramer
- Applicant: Vahid S. Moshtagh , Jeffrey C. Ramer
- Applicant Address: JP Tokyo
- Assignee: Toshiba Techno Center Inc.
- Current Assignee: Toshiba Techno Center Inc.
- Current Assignee Address: JP Tokyo
- Agency: Hogan Lovells US LLP
- Main IPC: C23C16/455
- IPC: C23C16/455 ; C23F1/00 ; H01L21/306 ; C23C16/06 ; C23C16/22

Abstract:
A shower head for a chemical vapor deposition chamber can have a housing, a plurality of bosses formed upon the housing, and an inside cover. The bosses can have bores formed therethrough. The inside cover can be attached to the bosses and can have apertures formed therein such that the apertures are generally contiguous with the bores. The housing, the bosses, and the inside cover cooperate to communicate water through the shower head. The water can cool the shower head to a temperature that is substantially lower than the temperature of other parts of the chemical vapor deposition chamber, e.g., the susceptor thereof.
Public/Granted literature
- US20090107403A1 BRAZED CVD SHOWER HEAD Public/Granted day:2009-04-30
Information query
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