Invention Grant
- Patent Title: Plasma generation method and apparatus
- Patent Title (中): 等离子体产生方法和装置
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Application No.: US13797201Application Date: 2013-03-12
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Publication No.: US08668813B2Publication Date: 2014-03-11
- Inventor: Miyamoto Makoto , Nakayama Yoko , Kumagai Yuuki , Takenoshita Kazutoshi
- Applicant: Samsung Electronics Co., Ltd
- Applicant Address: KR Suwon-Si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-Si
- Agency: Staas & Halsey LLP
- Priority: JP2010-273450 20101208
- Main IPC: B01J19/08
- IPC: B01J19/08

Abstract:
A plasma generation apparatus and method, which achieve both sterilization and deodorization of attached bacteria even under the condition that steam or fine droplets of water are present. A pair of electrodes is prepared, plasma discharge is carried out by applying designated voltage between the pair of electrodes, fluid passage holes are provided at corresponding parts of respective electrodes so as to communicate with each other, and steam or fine droplets of water are applied to the fluid passage holes and plasma generated around the fluid passage holes.
Public/Granted literature
- US20130189154A1 PLASMA GENERATION METHOD AND APPARATUS Public/Granted day:2013-07-25
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