Invention Grant
- Patent Title: Purifying method for metallic silicon and manufacturing method of silicon ingot
- Patent Title (中): 金属硅的净化方法及硅锭的制造方法
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Application No.: US12440531Application Date: 2008-06-24
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Publication No.: US08668895B2Publication Date: 2014-03-11
- Inventor: Yuma Kamiyama , Kazuyoshi Honda , Yasuharu Shinokawa , Hiromasa Yagi , Tomofumi Yanagi , Kunihiko Bessho
- Applicant: Yuma Kamiyama , Kazuyoshi Honda , Yasuharu Shinokawa , Hiromasa Yagi , Tomofumi Yanagi , Kunihiko Bessho
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: Brinks Gilson & Lione
- Priority: JP2007-167135 20070626
- International Application: PCT/JP2008/001627 WO 20080624
- International Announcement: WO2009/001547 WO 20081231
- Main IPC: C01B33/037
- IPC: C01B33/037

Abstract:
In a purifying method for metal grade silicon, metal grade silicon with a silicon concentration not less than 98 wt % and not more than 99.9 wt % is prepared. The metal grade silicon contains aluminum not less than 1000 ppm and not more than 10000 ppm by weight. The metal grade silicon is heated at a temperature not less than 1500° C. and not more than 1600° C. in an inert atmosphere under pressure not less than 100 Pa and not more than 1000 Pa, and maintained at the temperature in the atmosphere for a predetermined period.
Public/Granted literature
- US20090280049A1 PURIFYING METHOD FOR METALLIC SILICON AND MANUFACTURING METHOD OF SILICON INGOT Public/Granted day:2009-11-12
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