Invention Grant
- Patent Title: Method of manufacturing relief printing plate and printing plate precursor for laser engraving
- Patent Title (中): 制造凸版印刷版和激光雕版用印版前体的方法
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Application No.: US12320226Application Date: 2009-01-22
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Publication No.: US08669040B2Publication Date: 2014-03-11
- Inventor: Hiroshi Tashiro , Atsushi Sugasaki , Hisao Yamamoto
- Applicant: Hiroshi Tashiro , Atsushi Sugasaki , Hisao Yamamoto
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: SOLARIS Intellectual Property Group, PLLC
- Priority: JP2008-015457 20080125; JP2008-211830 20080820
- Main IPC: B41N1/00
- IPC: B41N1/00 ; B41F33/00 ; G03F7/00 ; G03F7/26

Abstract:
The invention provides a method of manufacturing a relief printing plate having at least engraving an area which is in a relief forming layer of a relief printing plate precursor for laser engraving and is to be exposed by scanning exposure using a fiber-coupled semiconductor laser which emits laser beam with a wavelength of 700 nm to 1,300 nm. The relief printing plate precursor has at least a relief forming layer provided over a support, and the relief forming layer contains at least a binder polymer and a photo-thermal conversion agent. The invention further provides a relief printing plate precursor for laser engraving which can be used in the method of manufacturing a relief printing plate.
Public/Granted literature
- US20090191481A1 Method of manufacturing relief printing plate and printing plate precursor for laser engraving Public/Granted day:2009-07-30
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