Invention Grant
- Patent Title: Method of manufacturing solid-state imaging device, solid-state imaging device, and electronic apparatus
- Patent Title (中): 固态成像装置，固态成像装置和电子装置的制造方法
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Application No.: US13238013Application Date: 2011-09-21
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Publication No.: US08669134B2Publication Date: 2014-03-11
- Inventor: Tomomi Ito , Ryoji Suzuki , Taichi Natori
- Applicant: Tomomi Ito , Ryoji Suzuki , Taichi Natori
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: Dentons US LLP
- Priority: JP2010-217861 20100928
- Main IPC: H01L21/00
- IPC: H01L21/00
Abstract:
Provided is a method of manufacturing a solid-state imaging device including: forming a first pattern having an independent island shape configured by an optical filter material on some of photoelectric conversion units among a plurality of photoelectric conversion units arranged on the surface of a substrate; forming a mixed color prevention layer on a side wall of the first pattern; and forming a second pattern having an independent island shape configured by an optical filter material on the rest of the photoelectric conversion units among the plurality of photoelectric conversion units while the mixed color prevention layer is closely disposed between the first pattern and the second pattern.
Public/Granted literature
- US20120075509A1 METHOD OF MANUFACTURING SOLID-STATE IMAGING DEVICE, SOLID-STATE IMAGING DEVICE, AND ELECTRONIC APPARATUS Public/Granted day:2012-03-29
Information query
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