Invention Grant
- Patent Title: Electron gun
- Patent Title (中): 电子枪
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Application No.: US13322025Application Date: 2010-04-14
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Publication No.: US08669535B2Publication Date: 2014-03-11
- Inventor: Mikio Ichihashi , Takashi Onishi , Shunichi Watanabe , Keiji Tamura
- Applicant: Mikio Ichihashi , Takashi Onishi , Shunichi Watanabe , Keiji Tamura
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2009-123684 20090522
- International Application: PCT/JP2010/002684 WO 20100414
- International Announcement: WO2010/134259 WO 20101125
- Main IPC: H01J1/50
- IPC: H01J1/50

Abstract:
The present invention has an object to provide a cold cathode field-emission electron gun with low aberration, to thereby provide a high-brightness electron gun even in the case of a large current. The present invention provides a field-emission electron gun which extracts an electron beam from a cathode and converges the extracted electron beam, the field-emission electron gun including: a magnetic field lens which is provided such that the cathode is disposed inside of a magnetic field of the lens; and an extraction electrode for extracting electrons from the cathode, the extraction electrode being formed into a cylindrical shape without an aperture structure. The present invention can provide an electron gun having a function of converging an electron beam using a magnetic field, the electron gun which is capable of reducing an incidental electrostatic lens action and has small aberration and high brightness.
Public/Granted literature
- US20120062094A1 ELECTRON GUN Public/Granted day:2012-03-15
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