Invention Grant
US08669537B2 Charged particle beam writing apparatus and method 有权
带电粒子束写入装置及方法

Charged particle beam writing apparatus and method
Abstract:
A charged particle beam writing apparatus and a charged particle beam writing method capable of shortening the time necessary to generate shot data and improving writing throughput. A graphic pattern defined in write data is divided into graphics represented in shot units. The divided graphics are temporarily stored in a memory and are distributed to their corresponding subfield areas while developing position information defined in a state of being compressed to write data. When each pattern is written by multi-pass writing, graphics divided at a first pass are used for distribution to subfield areas after a second pass.
Public/Granted literature
Information query
Patent Agency Ranking
0/0