Invention Grant
- Patent Title: Charged particle beam writing apparatus and method
- Patent Title (中): 带电粒子束写入装置及方法
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Application No.: US12560802Application Date: 2009-09-16
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Publication No.: US08669537B2Publication Date: 2014-03-11
- Inventor: Jun Yashima
- Applicant: Jun Yashima
- Applicant Address: JP Numazu-shi
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Numazu-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2008-240340 20080919
- Main IPC: G21K1/08
- IPC: G21K1/08

Abstract:
A charged particle beam writing apparatus and a charged particle beam writing method capable of shortening the time necessary to generate shot data and improving writing throughput. A graphic pattern defined in write data is divided into graphics represented in shot units. The divided graphics are temporarily stored in a memory and are distributed to their corresponding subfield areas while developing position information defined in a state of being compressed to write data. When each pattern is written by multi-pass writing, graphics divided at a first pass are used for distribution to subfield areas after a second pass.
Public/Granted literature
- US20100072390A1 CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD Public/Granted day:2010-03-25
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