Invention Grant
- Patent Title: Semiconductor device and arrangement method of compensation capacitor of semiconductor device
- Patent Title (中): 半导体器件补偿电容器的半导体器件和布置方法
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Application No.: US12722101Application Date: 2010-03-11
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Publication No.: US08669605B2Publication Date: 2014-03-11
- Inventor: Yoshiaki Shimizu
- Applicant: Yoshiaki Shimizu
- Agency: Foley & Lardner LLP
- Priority: JP2009-063657 20090316
- Main IPC: H01L29/92
- IPC: H01L29/92 ; H01L29/93

Abstract:
A semiconductor device comprises a circuit cell and a basic end cell. The circuit cell includes a plurality of elements aligned in a first direction, and the basic end cell is arranged adjacent to the circuit cell in the first direction and has a compensation capacitor capable of being connected to a supply voltage of the circuit cell. In the semiconductor device, a diffusion layer forming the compensation capacitor extends along the first direction in a predetermined region of the circuit cell.
Public/Granted literature
- US20100230734A1 SEMICONDUCTOR DEVICE AND ARRANGEMENT METHOD OF COMPENSATION CAPACITOR OF SEMICONDUCTOR DEVICE Public/Granted day:2010-09-16
Information query
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