Invention Grant
US08670103B2 Cleanup method for optics in immersion lithography using bubbles
有权
使用气泡的浸没式光刻技术中的光学清理方法
- Patent Title: Cleanup method for optics in immersion lithography using bubbles
- Patent Title (中): 使用气泡的浸没式光刻技术中的光学清理方法
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Application No.: US12003038Application Date: 2007-12-19
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Publication No.: US08670103B2Publication Date: 2014-03-11
- Inventor: Hidemi Kawai
- Applicant: Hidemi Kawai
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff, PLC
- Main IPC: G03B27/52
- IPC: G03B27/52
Abstract:
A liquid immersion exposure apparatus includes an optical system via which a substrate is exposed with an exposure beam, and a cleaning device which performs a cleaning operation by filling a space adjacent the optical system with a liquid including bubbles.
Public/Granted literature
- US20080100813A1 Cleanup method for optics in immersion lithography Public/Granted day:2008-05-01
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