Invention Grant
US08670104B2 Cleanup method for optics in immersion lithography with cleaning liquid opposed by a surface of object
有权
用于浸没光刻中的光学元件的清理方法，其中清洗液体与物体表面相对
- Patent Title: Cleanup method for optics in immersion lithography with cleaning liquid opposed by a surface of object
- Patent Title (中): 用于浸没光刻中的光学元件的清理方法，其中清洗液体与物体表面相对
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Application No.: US12382162Application Date: 2009-03-10
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Publication No.: US08670104B2Publication Date: 2014-03-11
- Inventor: Hidemi Kawai
- Applicant: Hidemi Kawai
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff, PLC
- Main IPC: G03B27/52
- IPC: G03B27/52
Abstract:
An immersion lithography apparatus and a cleanup method used for the immersion lithography apparatus in which an immersion liquid is supplied from a liquid supply member to a gap between an optical element of a projection optics and a workpiece during an immersion lithography process. A surface of an object, which is different from the workpiece, is provided such that the surface of the object and the optical element are opposite to each other. During a cleanup process, a cleaning liquid is supplied from the liquid supply member onto the surface of the object.
Public/Granted literature
- US20090195762A1 Cleanup method for optics in immersion lithography Public/Granted day:2009-08-06
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