Invention Grant
- Patent Title: Method and device for inspecting for defects
- Patent Title (中): 用于检查缺陷的方法和装置
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Application No.: US13700520Application Date: 2011-05-20
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Publication No.: US08670116B2Publication Date: 2014-03-11
- Inventor: Toshiyuki Nakao , Junguo Xu , Yuki Shimizu , Toshihiko Nakata , Toshifumi Honda , Yukihiro Shibata , Yuta Urano
- Applicant: Toshiyuki Nakao , Junguo Xu , Yuki Shimizu , Toshihiko Nakata , Toshifumi Honda , Yukihiro Shibata , Yuta Urano
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2010-171331 20100730
- International Application: PCT/JP2011/002809 WO 20110520
- International Announcement: WO2012/014357 WO 20120202
- Main IPC: G01N21/95
- IPC: G01N21/95

Abstract:
A defect inspecting method is provided which comprises a pre-scan defect inspecting process including a pre-scan irradiating step for casting irradiation light onto the surface of a sample, a pre-scan detecting step for detecting the scattered lights, and a pre-scan defect information collecting step for obtaining information on preselected defects present on the sample surface on the basis of the scattered lights; a near-field defect inspecting process including a near-field irradiating step in which the distance between the sample surface and a near-field head is adjusted so that the sample surface is irradiated, a near-field detecting step for detecting near-field light response, and a near-field defect information collecting step for obtaining information on the preselected defects on the basis of the near-field light response; and a merging process for inspecting defects present on the sample surface by merging the pieces of information on the preselected defects.
Public/Granted literature
- US20130155400A1 METHOD AND DEVICE FOR INSPECTING FOR DEFECTS Public/Granted day:2013-06-20
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