Invention Grant
- Patent Title: Device for measuring deformation of a structure and a method for measuring deformation of a structure using the same
- Patent Title (中): 用于测量结构变形的装置和用于测量使用其的结构的变形的方法
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Application No.: US13203217Application Date: 2010-03-02
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Publication No.: US08671769B2Publication Date: 2014-03-18
- Inventor: Seung Joo Haam , Yun Mook Lim , Yoon Cheol Lim , JoSeph Park
- Applicant: Seung Joo Haam , Yun Mook Lim , Yoon Cheol Lim , JoSeph Park
- Applicant Address: KR Seoul KR Seoul
- Assignee: Industry Academic Cooperation Foundation,Technovalue Co., Ltd.
- Current Assignee: Industry Academic Cooperation Foundation,Technovalue Co., Ltd.
- Current Assignee Address: KR Seoul KR Seoul
- Agency: Swanson & Bratschun, L.L.C.
- Priority: KR10-2009-0017315 20090227; KR10-2009-0017316 20090227; KR10-2009-0017317 20090227
- International Application: PCT/KR2010/001299 WO 20100302
- International Announcement: WO2010/098647 WO 20100902
- Main IPC: G01B11/16
- IPC: G01B11/16
Abstract:
The present invention is directed to a device for measuring a deformation ratio of a structure which includes a photonic crystal layer containing nanoparticles aligned at a certain interval. The device is useful for detecting when various industrial structures are deformed by a working load. The presence of deformation and the deformation ratio in the structures may be simply and easily measured by measuring the change of structural color or magnetic flux in the device. The device may be useful to prevent accidents due to excessive deformation in structures.
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